Direct nanoimprinting of metal nanoparticles for nanoscale electronics fabrication

被引:282
作者
Ko, Seung H.
Park, Inkyu
Pan, Heng
Grigoropoulos, Costas P. [1 ]
Pisano, Albert P.
Luscombe, Christine K.
Frechet, Jean M. J.
机构
[1] Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, BSAC, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
关键词
D O I
10.1021/nl070333v
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
One-step direct nanoimprinting of metal nanoparticles was investigated to fabricate nano-/microscale metallic structures such as nanodot and nanowire arrays. This was done at low temperatures and pressures, utilizing the low melting temperature and viscosity of metal nanoparticle solutions. Through precise control of the fluidic properties of the nanoparticle solution and the mold design, high-quality nanoscale features with no or negligible residual layer were nanoimprinted. Nanoscale electronic devices were also demonstrated, including nanowire resistors and nanochannel organic field effect transistors with an air-stable semiconducting polymer.
引用
收藏
页码:1869 / 1877
页数:9
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