Effect of the relaxation of the electron subsystem excitation in metals on the ionization probability of sputtered atoms

被引：4

作者：

Belykh, SF

Palitsin, VV

Adriaens, A

Adams, F

机构：

[1] Univ Instelling Antwerp, Dept Chem, B-2610 Antwerp, Belgium

[2] Univ Ghent, Dept Analyt Chem, B-9000 Ghent, Belgium

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2003年 / 203卷

关键词：

secondary ion emission; ion-metal interaction; sputtering; ionization probability; electron subsystem excitation; relaxation; semi-empirical model;

D O I：

10.1016/S0168-583X(02)02213-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A model describing the effect of the relaxation of the electron subsystem excitation in metals on the ionization process of sputtered atoms is proposed. It explains the strong difference in experimental velocity dependence of the ionization probability P+ of sputtered atoms measured for the same Ar+-Cu system. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：172 / 177

页数：6

共 31 条

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