Effects of annealing on photoluminescence of ZnO thin film prepared by vapor phase growth

被引:32
作者
Chen, J [1 ]
Fujita, T [1 ]
机构
[1] Hiroshima Univ, Dept Appl Phys, Grad Sch Engn, Higashihiroshima, Hiroshima 7398527, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 2A期
关键词
ZnO; exciton; annealing; photoluminescence;
D O I
10.1143/JJAP.42.602
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, we investigated the effects of annealing on the UV photoluminescence of ZnO films deposited on (0001) sapphire substrates by vapor phase growth. Before annealing, bound exciton lines dominate the band-edge emission at low excitation densities. However, at high excitation densities, free A- and B-exciton emissions are observed due to the saturation of bound exciton emissions. Annealing at 700 C in an oxygen atmosphere greatly affects the band-edge emissions. The free exciton emissions are significantly enhanced and become dominant, while the bound exciton emissions decrease notably after annealing. In addition, two emissions located at 3.306 and 3.220 eV are observed in the as-grown ZnO films. These are likely to be due to a donor-acceptor pair recombination and a localized exciton.
引用
收藏
页码:602 / 606
页数:5
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