Electrical transport properties of III-nitrides

被引:26
作者
Look, DC [1 ]
机构
[1] Wright State Univ, Res Ctr, Dayton, OH 45432 USA
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1997年 / 50卷 / 1-3期
关键词
band conduction; donor activation energies; hopping conduction;
D O I
10.1016/S0921-5107(97)00163-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Excellent n-type GaN layers have been grown by all of the major epitaxial techniques: MBE, MOCVD, and HVPE. In this work, we analyze the band conduction in such samples by temperature-dependent Hall-effect measurement and theory, and determine quantitative information on donor and acceptor concentrations, as well as donor activation energies. In HVPE layers it is necessary to take account of a degenerate n-type layer at the GaN/sapphire interface: in order to correctly analyze the bulk material. We also investigate hopping conduction, which occurs at low temperatures in conductive material, and at both low and hi-h temperatures in semi-insulating material. Finally, we show by analysis of electron-irradiation data that both the N vacancy and the N interstitial are electrically active, demonstrating donor and acceptor character, respectively. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:50 / 56
页数:7
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