共 8 条
[2]
Performance enhancements on IBM's EL-4 electron-beam lithography system
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1995, 13 (06)
:2478-2482
[3]
CHU HC, 1982, OPTIK, V61, P121
[4]
PREVAIL: Operation of the electron optics proof-of-concept system
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1999, 17 (06)
:2851-2855
[5]
HOSOKAWA T, 1981, OPTIK, V58, P241
[6]
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1999, 17 (06)
:2840-2846
[7]
PREVAIL: Theory of the proof of concept column electron optics
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1999, 17 (06)
:2847-2850
[8]
Zhu XQ, 1995, P SOC PHOTO-OPT INS, V2522, P66, DOI 10.1117/12.221617