Device parameter optimization for reduced short channel effects in retrograde doping MOSFET's

被引:22
作者
Agrawal, B [1 ]
De, VK [1 ]
Meindl, JD [1 ]
机构
[1] RENSSELAER POLYTECH INST, CTR INTEGRATED ELECTR, TROY, NY 12180 USA
关键词
D O I
10.1109/16.481743
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simple technique to optimize the device parameters of the retrograde channel doping MOSFET to minimize short channel effects for a constant threshold voltage is presented in this work. The results indicate that the highest possible substrate doping does not necessarily result in minimum short channel effects.
引用
收藏
页码:365 / 368
页数:4
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