Formation of the ZnSe/(Te/)GaAs(100) heterojunction

被引:35
作者
Gleim, T
Heske, C
Umbach, E
Schumacher, C
Gundel, S
Faschinger, W
Fleszar, A
Ammon, C
Probst, M
Steinrück, HP
机构
[1] Univ Wurzburg, DE-97074 Wurzburg, Germany
[2] Univ Erlangen Nurnberg, D-91058 Erlangen, Germany
关键词
photoelectron spectroscopy; molecular beam epitaxy; density functional calculations; gallium arsenide; zinc selenide; heterojunctions; semiconductor-semiconductor interfaces; semiconductor-semiconductor heterostructures;
D O I
10.1016/S0039-6028(03)00439-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the underlying electronic and structural effects of the previously published influence of a Te substrate pretreatment on the heterovalent ZnSe/GaAs(1 0 0) interface [Appl. Phys. Lett. 78 (2001) 1867]. For this purpose, photoelectron spectroscopy and density functional theory calculations were employed. To determine the valence band maximum accurately, the choice of suitable photon energies to maximize the contribution from the Gamma-point as weft as a variation of the k-vector by measuring under selected angles is investigated. We discuss the resulting band offsets with respect to the atomic interface structure and to the broadening of core level line shapes. The theoretical investigations focus on the effect of replacing Se by Te atoms at the interface, particularly in view of the lattice structure and the band offsets. We find that Te helps to establish a group-VI-rich interface, thus lowering the valence band offset, while maintaining a good crystal quality by acting as a diffusion barrier for Se atoms. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:77 / 85
页数:9
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