Implications of high resolution to near-field optical microscopy

被引:32
作者
Novotny, L
Hecht, B
Pohl, DW
机构
[1] Pacific NW Natl Lab, Richland, WA 99352 USA
[2] ETH Zurich, CH-8092 Zurich, Switzerland
[3] IBM Corp, Div Res, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland
关键词
near-field optics; scanning near-field optical microscopy; nanotechnology;
D O I
10.1016/S0304-3991(97)00066-1
中图分类号
TH742 [显微镜];
学科分类号
摘要
This paper presents problems inherent to high-resolution near-field optical microscopy. It is shown on an easily understandable level, that high lateral confinement of optical fields (a prerequisite for high-resolution microscopy) leads to a fast decay of the fields. Consequently, the optical probe has to be brought very close to the sample surface, increasing the sensitivity to artifacts. Highly confined optical fields are strongly sensitive to variations in the probe-sample separation. The resulting optical images are, therefore, dominated by topographical variations and do not represent the optical properties of the sample surface. (C) 1998 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:341 / 344
页数:4
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