A surface sensitive optical method for the evaluation of processed ZnO: exploitation of LO phonon interaction

被引：10

作者：

Harada, C ^{[1
]}

Goto, H

Minegishi, T

Suzuki, T

Makino, H

Cho, MW

Yao, T

机构：

[1] Tohoku Univ, Interdisciplinary Res Ctr, Aoba Ku, Sendai, Miyagi 9808578, Japan

[2] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

CURRENT APPLIED PHYSICS | 2004年 / 4卷 / 06期

关键词：

ZnO; etching; surface property; LO phonon;

D O I：

10.1016/j.cap.2004.01.037

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on a surface property of bulk ZnO crystals and an optical method to evaluate it. Bulk ZnO crystals have a damaged surface layer due to chemomechanical polishing. We prepared the ZnO crystals by etching, and evaluated the improvement of the surface by high-resolution X-ray diffraction (XRD) and photoluminescence (PL). In PL measurements, the relative intensity of the first order longitudinal optical phonon replica of free exciton (FX-1LO) to second order process (FX-2LO) was compared. The relative intensity becomes weak with increasing etched depth and finally saturates at the etched depth of 5 mum. This result agrees well with XRD results. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：633 / 636

页数：4

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