Studies on high resolution x-ray diffraction, optical and transport properties of InAsxSb1-x/GaAs (x≤0.06) heterostructure grown using liquid phase epitaxy

被引:18
作者
Dixit, VK
Bansal, B
Venkataraman, V
Bhat, HL
Chandrasekharan, KS
Arora, BM
机构
[1] Ctr Adv Technol, Laser Phys Div, Indore 452013, India
[2] Indian Inst Sci, Dept Phys, Bangalore 560012, Karnataka, India
[3] Tata Inst Fundamental Res, Bombay 400005, Maharashtra, India
关键词
D O I
10.1063/1.1784620
中图分类号
O59 [应用物理学];
学科分类号
摘要
The growth of InAsxSb1-x/GaAs (xless than or equal to0.06) heterostructures has been achieved using liquid phase epitaxy. High resolution x-ray diffraction studies reveal that the films are single crystalline and structurally coherent with the substrate. It is also inferred from these measurements that the in-plane and out-of-plane strain arising out of mismatched epitaxy is almost completely relaxed, leading to a high dislocation density. The room temperature energy gap is measured to be 0.13 eV for InAs0.06Sb0.94/GaAs. Temperature dependence of the energy gap is studied between 93 and 433 K through the absorption spectra. Temperature dependent Hall and mobility measurements carried out between 10 and 370 K on these samples are discussed. (C) 2004 American Institute of Physics.
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页码:4989 / 4997
页数:9
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