Calculation of the anisotropy of the hall mobility in n-type 4H- and 6H-SiC

被引:19
作者
Kinoshita, T
Itoh, KM
Muto, J
Schadt, M
Pensl, G
Takeda, K
机构
[1] Keio Univ, Dept Instrumentat Engn, Kohoku Ku, Yokohama, Kanagawa 223, Japan
[2] Univ Erlangen Nurnberg, Inst Angew Phys, D-91058 Erlangen, Germany
[3] Waseda Univ, Dept Mat Sci & Engn, Shinjuku Ku, Tokyo 169, Japan
来源
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 | 1998年 / 264-2卷
关键词
4H-SiC; 6H-SiC; hall effect; mobility; anisotropy;
D O I
10.4028/www.scientific.net/MSF.264-268.295
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on calculations of the anisotropy of the electron Hall mobility and its temperature dependence in single crystals of 6H- and 4H-SiC assuming parabolic conduction bands of cigar-shaped constant energy surfaces having three different effective masses in directions perpendicular to each other. Our results agree well with the experimentally determined anisotropic Hall mobility in 6H- and 4H-SiC.
引用
收藏
页码:295 / 298
页数:4
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