Tuning surface reactivity via electron quantum confinement

被引：109

作者：

Aballe, L ^{[1
]}

Barinov, A ^{[1
]}

Locatelli, A ^{[1
]}

Heun, S ^{[1
]}

Kiskinova, M ^{[1
]}

机构：

[1] Sincrotrone Trieste, I-34012 Trieste, Italy

来源：

PHYSICAL REVIEW LETTERS | 2004年 / 93卷 / 19期

关键词：

D O I：

10.1103/PhysRevLett.93.196103

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The effect of electron quantum confinement on the surface reactivity of ultrathin metal films is explored by comparing the initial oxidation rate of atomically flat magnesium films of different thickness, using complementary microscopy techniques. Pronounced thickness-dependent variations in the oxidation rate are observed for well ordered films of up to 15 atomic layers. Quantitative comparison reveals direct correlation between the surface reactivity and the periodic changes in the density of electronic states induced by quantum-well states crossing the Fermi level.

引用

页码：196103 / 1

页数：4