Composition and structure of titanium carbonitride thin film synthesized by ion implantation

Ion implantation was used to synthesize a uniformly thick film of titanium carbonitride TiC0.3N0.3. The implantation conditions were calculated with the help of the TRIM program. The profiles measured by Rutherford backscattering spectrometry (RES) are in good agreement with the calculations. Secondary ion mass spectrometry (SIMS) measurements confirm the shape of the profiles obtained by RES and also show the partial oxidation of the outermost titanium layer. X-Ray grazing incidence diffraction indicates that the titanium carbonitride layer is composed of very small crystallites (34 nm) with an NaCl-type structure. The chemical shifts of the photoelectron lines confirm that nitrogen and carbon atoms are strongly bonded to titanium atoms.