TIN, TIC AND TI(C,N) FILM CHARACTERIZATION AND ITS RELATIONSHIP TO TRIBOLOGICAL BEHAVIOR

被引:118
作者
BERTONCELLO, R
CASAGRANDE, A
CASARIN, M
GLISENTI, A
LANZONI, E
MIRENGHI, L
TONDELLO, E
机构
[1] UNIV BOLOGNA,MET GRP,I-40136 BOLOGNA,ITALY
[2] CTR NAZL RIC & SVILUPPO MAT,I-72023 MESAGNE,ITALY
关键词
D O I
10.1002/sia.740180712
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning electron microscopy observations, energy dispersive spectroscopy, x-ray diffraction and x-ray photoelectron spectroscopy analyses have been employed to study the composition and the microstructure of titanium carbonitride coatings deposited by a reactive ion-plating industrial system. Both TiN and Ti(C, N) coatings show a very fine and dense microstructure and consist of a NaCl-type single phase with a marked preferred orientation. X-ray photoelectron spectroscopy analysis of the characteristic Ti, C and N lines establishes the extent of Ti(C, N) compound formation and the dependence of composition on the reactive gas flow ratio. Depth profiles obtained by XPS analyses after cycles of Ar+ sputtering indicate chemical uniformity of the films. Microhardness measurements taken on coated HSS specimens show that Ti(C, N) are significantly harder than TiN and TiC films deposited under the same conditions. Ti(C, N) coatings have a lower coefficient of friction and a higher wear resistance than TiN coatings, irrespective of the mating material.
引用
收藏
页码:525 / 531
页数:7
相关论文
共 18 条
  • [1] REDUCTION OF OXIDES OF IRON, COBALT, TITANIUM AND NIOBIUM BY LOW-ENERGY ION-BOMBARDMENT
    CHOUDHURY, T
    SAIED, SO
    SULLIVAN, JL
    ABBOT, AM
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1989, 22 (08) : 1185 - 1195
  • [2] HATSCHEK RL, 1982, AM MACH, V3, P129
  • [3] MICROSTRUCTURE EVOLUTION IN TIN FILMS REACTIVELY SPUTTER DEPOSITED ON MULTIPHASE SUBSTRATES
    HELMERSSON, U
    SUNDGREN, JE
    GREENE, JE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 500 - 503
  • [4] HOLLECK H, 1986, J VAC SCI TECHNOL A, V6, P2261
  • [5] ASPECTS OF ESCA SPECTRA OF SINGLE-CRYSTALS AND THIN-FILMS OF TITANIUM CARBIDE
    IHARA, H
    KUMASHIRO, Y
    ITOH, A
    MAEDA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (09) : 1462 - 1463
  • [6] MICROSTRUCTURE AND HARDNESS OF TI(C,N) COATINGS ON STEEL PREPARED BY THE ACTIVATED REACTIVE EVAPORATION TECHNIQUE
    JACOBSON, BE
    DESHPANDEY, CV
    DOERR, HJ
    KARIM, AA
    BUNSHAH, RF
    [J]. THIN SOLID FILMS, 1984, 118 (03) : 285 - 292
  • [7] ENERGY-DEPENDENCE OF THE ION-INDUCED SPUTTERING YIELDS OF MONATOMIC SOLIDS
    MATSUNAMI, N
    YAMAMURA, Y
    ITIKAWA, Y
    ITOH, N
    KAZUMATA, Y
    MIYAGAWA, S
    MORITA, K
    SHIMIZU, R
    TAWARA, H
    [J]. ATOMIC DATA AND NUCLEAR DATA TABLES, 1984, 31 (01) : 1 - 80
  • [8] Matthews A., 1985, SURF ENG, V1, P93
  • [9] MOLINE RA, 1975, ATOMIC COLLISIONS SO, V1
  • [10] CATHODIC ARC PLASMA DEPOSITION OF TIC AND TICXN1-X FILMS
    RANDHAWA, H
    [J]. THIN SOLID FILMS, 1987, 153 : 209 - 218