Nanoindentation characterization of ZnO thin films

被引：81

作者：

Fang, Te-Hua

Chang, Win-Jin ^{[1
]}

Lin, Chao-Ming

机构：

[1] Kun Shan Univ, Dept Engn Mech, Tainan 710, Taiwan

[2] Natl Formosa Univ, Inst Mech & Electromech Engn, Yunlin 632, Taiwan

[3] WuFeng Inst Technol, Dept Mech Engn, Chiayi 621, Taiwan

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2007年 / 452卷

关键词：

thin films; X-ray diffraction; mechanical properties;

D O I：

10.1016/j.msea.2006.11.008

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 [材料科学与工程]; 080502 [材料学];

摘要：

The effects of the indentation load, indentation-loading time and the creep behavior of 2-3 mu m thick ZnO films deposited on a Si(1 0 0) substrate were investigated by nanoindentation. The ZnO thin films were deposited under different sputtering powers by a radio frequency magnetron sputtering system. The crystallographic and surface properties of the films were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). Results showed that Young's modulus and the hardness of the films increased as the sputtering power was increased. The hardness and Young's modulus slightly decreased as the indentation rate and creep time were increased. The best ZnO film mechanical properties were found at a sputtering power of 225 W. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：715 / 720

页数：6

共 25 条

[1]

Synthesis and characterization of TiC and TiCN coatings [J].