Over 27% efficiency GaAs/InGaAs mechanically stacked solar cell

被引:14
作者
Matsubara, H
Tanabe, T
Moto, A
Mine, Y
Takagishi, S
机构
[1] Sumitomo Elect Ind Ltd, Basic High Technol Labs, Itami, Hyogo 664, Japan
[2] Sumitomo Elect Ind Ltd, Syst & Elect R&D Ctr, Itami, Hyogo 664, Japan
关键词
GaAs/InGaAs; solar cells; efficiency;
D O I
10.1016/S0927-0248(97)00142-6
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We have applied an InGaAs solar cell (band gap = 0.75 eV) to the bottom cell of the super-high-efficiency tandem solar cell aiming an over 35% conversion efficiency. The InGaAs cell which is lattice-matched to the InP substrate showed the efficiency of 5.5% under the GaAs substrate with low carrier concentration. Combining with the GaAs cell by means of a mechanically stacking technique, we obtained an efficiency of 28.8% at air mass (AM) 1.5, 1-sun. This result suggests the possibility of the cells with the efficiency of over 35% with combining a GaInP/GaAs monolithic tandem cell and the InGaAs cell (or InGaAsP cell).
引用
收藏
页码:177 / 184
页数:8
相关论文
共 9 条
[1]  
BERTNESS KA, 1994, P 1 WORLD C PHOT EN, P1671
[2]   USE OF TERTIARYBUTYLARSINE FOR GAAS GROWTH [J].
CHEN, CH ;
LARSEN, CA ;
STRINGFELLOW, GB .
APPLIED PHYSICS LETTERS, 1987, 50 (04) :218-220
[3]   GaInNAs: A novel material for long-wavelength-range laser diodes with excellent high-temperature performance [J].
Kondow, M ;
Uomi, K ;
Niwa, A ;
Kitatani, T ;
Watahiki, S ;
Yazawa, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (2B) :1273-1275
[4]  
MATSUBARA H, 1994, P 1 WCPEC IEEE, P1871
[5]  
MATSUBARA H, 1993, PVSEC 7 NAG
[6]  
SHARPS PR, 1994, P 1 WCPEC IEEE, P1725
[7]  
TAKAMOTO T, 1994, P 1 WORLD C PHOT EN, P1729
[8]   SI-DOPING IN GAAS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY USING TERTIARYBUTYLARSINE AND TETRAETHYLSILANE [J].
TANABE, T ;
MATSUBARA, H ;
SAEGUSA, A ;
KIMURA, H ;
TAKAGISHI, S ;
SHIRAKAWA, T ;
TADA, K .
JOURNAL OF CRYSTAL GROWTH, 1994, 145 (1-4) :408-413
[9]  
WANLASS MW, 1990, P 21 IEEE PHOT SPEC, P172