Effect of interfacial segregation on phase decomposition of a thin film on a patterned substrate

被引:13
作者
Johnson, WC
Wise, SM
Huh, JY
Favergeon, J
机构
[1] Univ Virginia, Dept Mat Sci & Engn, Charlottesville, VA 22904 USA
[2] Korea Univ, Div Engn & Mat Sci, Seoul 136701, South Korea
基金
美国国家科学基金会;
关键词
thin film; patterned substrate; phase decomposition; segregation; wetting;
D O I
10.1007/BF03027222
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Numerical simulations of phase decomposition in thin films on patterned substrates are presented for a binary alloy in order to study the influence of substrate composition on microstructural evolution. For systems with a substrate composition less than the film composition, a preferential segregation of A to the interface was observed and no phase decomposition occurred within the film. For patterned systems with a substrate composition exceeding the film composition, the B-rich phase was able to grow by a barrierless transformation for a range of film compositions outside the chemical spinodal. The number of precipitates which formed on the mesa, the dihedral angles at the three-phase trijunctions, and the resulting microstructure within the film were shown to be sensitive to the substrate composition.
引用
收藏
页码:1 / 8
页数:8
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