Negative index gratings in germanosilicate planar waveguides

被引：11

作者：

Canning, J ^{[1
]}

Moss, D ^{[1
]}

Aslund, M ^{[1
]}

Bazylenko, M ^{[1
]}

机构：

[1] Univ Sydney, Opt Fibre Technol Ctr, Australian Photon Cooperat Res Ctr, Natl Innovat Ctr 101, Eveleigh, NSW 1430, Australia

来源：

ELECTRONICS LETTERS | 1998年 / 34卷 / 04期

关键词：

D O I：

10.1049/el:19980259

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

>25dB negative index Bragg gratings have been written into germanosilicate waveguides fabricated by hollow-cathode plasma enhanced chemical vapour deposition (HC-PECVD). Differences in growth behaviour between the two polarisation states are observed.

引用

页码：366 / 367

页数：2

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