Structural changes on annealing of MBE grown (Ga, In) (N, As) as measured by X-ray absorption fine structure

被引:12
作者
Gambin, V
Lordi, V
Ha, W
Wistey, M
Takizawa, T
Uno, K
Friedrich, S
Harris, J
机构
[1] Stanford Univ, Solid State & Photon Lab, Stanford, CA 94305 USA
[2] Matsushita Elect Ind Co Ltd, Osaka, Japan
[3] Wakayama Univ, Wakayama, Japan
[4] Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
关键词
crystal structure; X-ray absorption fine structure; molecular beam epitaxy; semiconducting III-V materials;
D O I
10.1016/S0022-0248(02)02194-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
GaInNAs grown on GaAs has recently been found to optically emit at wavelengths longer than previously possible with material grown epitaxially on GaAs substrates. To improve radiative efficiency, material is annealed after growth, after which the band gap is found to significantly blueshift. Structural changes that occur during this annealing process were studied using fluorescent X-ray absorption fine structure. By comparing the absorption data with lattice parameter and band structure simulations, it was found that the number of In atoms surrounding N atoms increased after the high-temperature annealing. According to ab initio simulations this ordering will increase the band gap of the GaInNAs alloy. We believe the reduction of free energy drives the reordering process towards increasing In-N coordination. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:408 / 411
页数:4
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