Characteristics of plasma screening in ablation shaping of deep channels by high-intensity laser radiation

被引：14

作者：

Garnov, SV ^{[1
]}

Klimentov, SM ^{[1
]}

Konov, VI ^{[1
]}

Kononenko, TV ^{[1
]}

Dausinger, F ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Gen Phys, Moscow 117942, Russia

来源：

QUANTUM ELECTRONICS | 1998年 / 28卷 / 01期

关键词：

D O I：

10.1070/QE1998v028n01ABEH001134

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Determination of the rates of laser ablation (etching) of various materials by powerful (up to 10(14) W cm(-2)) pulsed radiation revealed a considerable reduction in the etching efficiency during shaping of deep ablated channels. The optical characteristics of the resultant plasma-vapour plume were measured. These measurements and numerical estimates led to the suggestion of two possible physical mechanisms of additional screening resulting from the interaction with the channel walls: limitation of plasma expansion and an increase of its density because of evaporation of the wall material by the radiation emitted from the plasma plume.

引用

页码：42 / 45

页数：4