Novel linear and crosslinking polymers for nanoimprinting with high etch resistance

Aromatic polymers based on methacrylates (linear polymers) and multifunctional allylesters (crosslinked polymers) have been prepared. They feature high dry etch resistance and good imprintability in a hot embossing process. The crosslinked polymers and their prepolymers were investigated in detail. Their characteristic molecular weight distribution and thermo-mechanical behaviour were studied with respect to the crosslinking process and compared with those of linear polymers. The thermal stability of imprinted patterns has been investigated for both, linear and crosslinked aromatic polymers. The latter ones show excellent stability up to test temperatures of 200 degrees C directly after the imprint process.