Two-flux composite fermion series of the fractional quantum Hall states in strained Si -: art. no. 156805

被引:67
作者
Lai, K [1 ]
Pan, W
Tsui, DC
Lyon, S
Mühlberger, M
Schäffler, F
机构
[1] Princeton Univ, Dept Elect Engn, Princeton, NJ 08544 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
[3] Univ Linz, Inst Halbleiterphys, A-4040 Linz, Austria
基金
奥地利科学基金会; 美国国家科学基金会;
关键词
D O I
10.1103/PhysRevLett.93.156805
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Magnetotransport properties are investigated in a high-mobility two-dimensional electron system in the strained Si quantum well of a (100) Si0.75Ge0.25/Si/Si0.75Ge0.25 heterostructure, at temperatures down to 30 mK and in magnetic fields up to 45 T. We observe around nu=1/2 the two-flux composite fermion (CF) series of the fractional quantum Hall effect (FQHE) at nu=2/3, 3/5, 4/7, and at nu=4/9,2/5,1/3. Among these FQHE states, the nu=1/3,4/7, and 4/9 states are seen for the first time in the Si/SiGe system. Interestingly, of the CF series, the 3/5 state is weaker than the nearby 4/7 state and the 3/7 state is conspicuously missing, resembling the observation in the IQHE regime that the nu=3 is weaker than the nearby nu=4 state. Our results can be quantitatively understood in the picture of CF's with the valley degree of freedom.
引用
收藏
页码:156805 / 1
页数:4
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