Polymer thin films on patterned Si surfaces

被引:30
作者
Li, Z
Tolan, M
Hohr, T
Kharas, D
Qu, S
Sokolov, J
Rafailovich, MH [1 ]
Lorenz, H
Kotthaus, JP
Wang, J
Sinha, SK
Gibaud, A
机构
[1] SUNY Stony Brook, Dept Mat Sci & Engn, Stony Brook, NY 11794 USA
[2] Univ Kiel, Inst Expt Phys, D-24098 Kiel, Germany
[3] Univ Munich, Sekt Phys, D-80539 Munich, Germany
[4] Argonne Natl Lab, APS, Argonne, IL 60439 USA
[5] Univ Maine, Fac Sci, F-72017 Le Mans, France
关键词
D O I
10.1021/ma970977x
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The propagation of roughness from a patterned silicon surface by polymer thin films was measured as a function of film thickness, time, and surface interaction using atomic force microscopy and synchrotron X-ray reflection. In the presence of an interacting surface, the decay length of the surface modulation was much longer than that observed in simple liquids. By measuring the time dependence of the surface corrugation amplitude, we were able to extract a surface diffusion coefficient by applying a modified version of the Mullins theory for surface diffusion in crystalline solids. The measured diffusion coefficients were an order of magnitude smaller than in the bulk, and scaled as 1/M-3/2, in agreement with previous SIMS results. The results are interpreted in terms of surface interactions confining polymer chains over distances larger than the radii of gyration.
引用
收藏
页码:1915 / 1920
页数:6
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