Band alignments of the platinum/SrBi2Ta2O9 interface

被引:28
作者
Gutleben, CD
机构
[1] Research Center, Sony Corporation
关键词
D O I
10.1063/1.120402
中图分类号
O59 [应用物理学];
学科分类号
摘要
In situ x-ray photoelectron spectroscopy was used to determine the band alignments of the platinum to SrBi2Ta2O9 contact. The interfaces were prepared by incremental evaporation of Pt onto a vacuum/O-2 annealed polycrystalline surface grown by the sol-gel method. The results track the development of the band alignments from the submonolayer to the thick metal-film regimes. The Fermi level to ferroelectric valence-band offset of the asymptotic full metal contact was found to be 2.9 eV. The contact was also clearly shown to be highly disrupted with a bismuth-platinum alloy forming at the interface.
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页码:3444 / 3446
页数:3
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