In situ wavefront correction and its application to micromanipulation

被引:394
作者
Cizmar, Tomas [1 ]
Mazilu, Michael [1 ]
Dholakia, Kishan [1 ]
机构
[1] Univ St Andrews, Sch Phys & Astron, SUPA, Haugh KY16 9SS, Fife, Scotland
基金
英国工程与自然科学研究理事会;
关键词
HOLOGRAPHIC OPTICAL TWEEZERS; ABERRATION CORRECTION; ADAPTIVE OPTICS; LIGHT; LASER; IMAGE; RESOLUTION; BESSEL; MEDIA; BEAMS;
D O I
10.1038/NPHOTON.2010.85
中图分类号
O43 [光学];
学科分类号
070207 [光学];
摘要
In any optical system, distortions to a propagating wavefront reduce the spatial coherence of a light field, making it increasingly difficult to obtain the theoretical diffraction-limited spot size. Such aberrations are severely detrimental to optimal performance in imaging, nanosurgery, nanofabrication and micromanipulation, as well as other techniques within modern microscopy. We present a generic method based on complex modulation for true in situ wavefront correction that allows compensation of all aberrations along the entire optical train. The power of the method is demonstrated for the field of micromanipulation, which is very sensitive to wavefront distortions. We present direct trapping with optimally focused laser light carrying power of a fraction of a milliwatt as well as the first trapping through highly turbid and diffusive media. This opens up new perspectives for optical micromanipulation in colloidal and biological physics and may be useful for various forms of advanced imaging.
引用
收藏
页码:388 / 394
页数:7
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