CRYSTALLIZATION OF AMORPHOUS SPUTTERED 55-PERCENT-CR-45-PERCENT-NI THIN-FILMS

被引：23

作者：

BIRJEGA, MI

CONSTANTIN, CA

FLORESCU, IT

SARBU, C

机构：

来源：

THIN SOLID FILMS | 1982年 / 92卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90154-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：315 / 321

页数：7

共 11 条

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[7] CRYSTAL-STRUCTURE OF VERY SMALL PARTICLES OF CHROMIUM AND IRON [J].

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[8] STRUCTURAL AND ELECTRICAL PROPERTIES OF EVAPORATED CR-NI FILMS AS A FUNCTION OF GAS PRESSURE [J].

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THIN SOLID FILMS, 1973, 17 (01) :105-111

[9] STRUCTURAL AND ELECTRICAL PROPERTIES OF SPUTTERED CRNI FILMS [J].

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[10]

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