DIRECT ION-BEAM DEPOSITION FOR THIN-FILM FORMATION

[1] AMANO J, 1977, J VAC SCI TECHNOL, V14, P695, DOI 10.1116/1.569185

[2] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (02): : 690 - 694

[3] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02): : 591 - 595

[4] AMANO J, 1978, J VAC SCI TECHNOL, V15, P113

[5] Chu WK., 1978, BACKSCATTERING SPECT

[6] Maissel L.I., 1970, HDB THIN FILM TECHNO

[7] MATTOX DM, 1973, SPUTTER DEPOSITION I

[8] HIGH INTENSITY LOW ENERGY SPREAD ION SOURCE FOR CHEMICAL ACCELERATORS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (01) : 102 - +

[9] OHMAE N, 1977, 7TH P INT VAC C 3RD, P1607

[10] THOMAS GE, 1977, 3RD P INT C SURF CHE, P136

[1] AMANO J, 1977, J VAC SCI TECHNOL, V14, P695, DOI 10.1116/1.569185

[2] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (02): : 690 - 694

[3] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02): : 591 - 595

[4] AMANO J, 1978, J VAC SCI TECHNOL, V15, P113

[5] Chu WK., 1978, BACKSCATTERING SPECT

[6] Maissel L.I., 1970, HDB THIN FILM TECHNO

[7] MATTOX DM, 1973, SPUTTER DEPOSITION I

[8] HIGH INTENSITY LOW ENERGY SPREAD ION SOURCE FOR CHEMICAL ACCELERATORS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (01) : 102 - +

[9] OHMAE N, 1977, 7TH P INT VAC C 3RD, P1607

[10] THOMAS GE, 1977, 3RD P INT C SURF CHE, P136