ACTIVATION RATIO OF FE IN FE-DOPED SEMIINSULATING INP EPITAXIAL LAYERS GROWN BY LIQUID-PHASE EPITAXY AND METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:20
作者
SUGAWARA, M
KONDO, M
NAKAI, K
YAMAGUCHI, A
NAKAJIMA, K
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D O I
10.1063/1.97845
中图分类号
O59 [应用物理学];
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页码:1432 / 1434
页数:3
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