ABSOLUTE MEASUREMENT OF LOW-ENERGY ELECTRON DEPOSITION PROFILES IN SEMI-INFINITE GEOMETRIES

被引：8

作者：

LOCKWOOD, GJ ^{[1
]}

MILLER, GH ^{[1
]}

HALBLEIB, JA ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

关键词：

D O I：

10.1109/TNS.1973.4327415

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：326 / 330

页数：5

共 8 条

[1] ATTIX FH, 1968, RADIATION DOSIMETRY, pCH7
[2] BERGER MJ, 1968, ETRAN MONTE CARLO CO
[3] 2 00-MEV ELECTRON DEPTH-DOSE MEASUREMENTS IN ALUMINUM, COPPER AND TIN ABSORBERS USING A RADIOCHROMIC DYE FILM
EISEN, H
SILVERMA.J
ROSENSTE.M
[J]. INTERNATIONAL JOURNAL OF APPLIED RADIATION AND ISOTOPES, 1972, 23 (03): : 97 - +
[4] EISEN H, 1971, THESIS U MARYLAND
[5] FREDERICKSON AR, 1972, IEEE T NUCL SCI, VNS19, P160
[6] HALBLEIB JA, 1971, SCDR710598 SAND LAB
[7] A THEORY OF CAVITY IONIZATION
SPENCER, LV
ATTIX, FH
[J]. RADIATION RESEARCH, 1955, 3 (03) : 239 - 254
[8] SPENCER LV, 1959, NBS1 MON