REAL-TIME MEASUREMENT OF DEPOSITION INITIATION AND RATE IN LASER CHEMICAL VAPOR-DEPOSITION

被引：32

作者：

ALLEN, SD

JAN, RY

MAZUK, SM

VERNON, SD

机构：

来源：

关键词：

D O I：

10.1063/1.335680

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：327 / 331

页数：5

共 20 条

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[2] PROPERTIES OF SEVERAL TYPES OF FILMS DEPOSITED BY LASER CVD
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 469 - 470
[3] LASER CHEMICAL VAPOR-DEPOSITION OF SELECTED AREA FE AND W FILMS
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[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) : 1641 - 1643
[4] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION
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[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6501 - 6505
[5] ALLEN SD, 1983, MATER RES SOC S P, V17, P207
[6] ALLEN SD, 1983, LASER FOCUS, V19, P14
[7] Allen SJ, UNPUB
[8] BREILAND WG, 1983, P SOC PHOTO-OPT INST, V385, P146, DOI 10.1117/12.934969
[9] KINETICS AND MECHANISM OF THERMAL DECOMPOSITION OF NICKEL TETRACARBONYL
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[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1968, 90 (25) : 6933 - &
[10] EDWARDS RH, 1984, SPIE P, V459, P41