THERMAL ELECTRON-ATTACHMENT TO SF6 AND CFCL3

被引:56
作者
CROMPTON, RW
HADDAD, GN
机构
来源
AUSTRALIAN JOURNAL OF PHYSICS | 1983年 / 36卷 / 01期
关键词
D O I
10.1071/PH830015
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
26
引用
收藏
页码:15 / 25
页数:11
相关论文
共 26 条
[1]   LINE-SHAPES FOR ATTACHMENT OF THRESHOLD ELECTRONS TO SF6 AND CFCL3 - THRESHOLD PHOTOELECTRON (TPSA) STUDIES OF XE, CO, AND C2H2 [J].
AJELLO, JM ;
CHUTJIAN, A .
JOURNAL OF CHEMICAL PHYSICS, 1979, 71 (03) :1079-1087
[2]   THERMAL ELECTRON-ATTACHMENT RATE TO CCL4, CHCL3, CH2CL2, AND SF6 [J].
AYALA, JA ;
WENTWORTH, WE ;
CHEN, ECM .
JOURNAL OF PHYSICAL CHEMISTRY, 1981, 85 (26) :3989-3994
[3]   ELECTRON ATTACHMENT TO HALOGENATED ALIPHATIC HYDROCARBONS [J].
BLAUNSTE.RP ;
CHRISTOP.LG .
JOURNAL OF CHEMICAL PHYSICS, 1968, 49 (04) :1526-&
[4]   MEASUREMENT OF LATERAL DIFFUSION COEFFICIENTS AND FIRST TOWNSEND COEFFICIENTS FOR ELECTRONS IN HELIUM BY AN ELECTRON-DENSITY SAMPLING METHOD [J].
CAVALLERI, G .
PHYSICAL REVIEW, 1969, 179 (01) :186-+
[5]   EXPERIMENTAL DETERMINATION OF RATE CONSTANTS FOR THERMAL ELECTRON ATTACHMENT TO GASEOUS SF6 AND C7F14 [J].
CHEN, E ;
GEORGE, RD ;
WENTWORT.WE .
JOURNAL OF CHEMICAL PHYSICS, 1968, 49 (04) :1973-&
[6]   CROSS SECTIONS FOR ELECTRON ATTACHMENT RESONANCES PEAKING AT SUBTHERMAL ENERGIES [J].
CHRISTOP.LG ;
MCCORKLE, DL ;
CARTER, JG .
JOURNAL OF CHEMICAL PHYSICS, 1971, 54 (01) :253-&
[7]  
CHRISTOPHOROU LG, 1980, GASEOUS DIELECTRICS, V2
[8]  
CHUTJIAN A, 1982, PHYS REV LETT, V48, P289, DOI 10.1103/PhysRevLett.48.289
[10]   NONDISSOCIATIVE ELECTRON CAPTURE IN COMPLEX MOLECULES AND NEGATIVE-ION LIFETIMES [J].
COMPTON, RN ;
CHRISTOPHOROU, LG ;
HURST, GS ;
REINHARDT, PW .
JOURNAL OF CHEMICAL PHYSICS, 1966, 45 (12) :4634-+