LASER POWERED HOMOGENEOUS PYROLYSIS OF SILANE

[1] KINETICS OF THERMAL UNIMOLECULAR REACTIONS OF CYCLOPROPANE AND CYCLOBUTANE BEHIND REFLECTED SHOCK-WAVES [J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1974, 70 : 1782 - 1792

[2] TEMPERATURE-DEPENDENCE OF THE GROWTH-RATE OF SILICON PREPARED THROUGH CHEMICAL VAPOR-DEPOSITION FROM SILANE [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 153 - 155

[3] BENSON SW, 1970, NSRDS NBS, V21, P223

[4] FLOW PYROLYSIS AND DIRECT AND SIF4-SENSITIZED LASER-INDUCED DECOMPOSITION OF TETRALIN - IDENTIFICATION OF RETRO-[2+4] CLEAVAGE AS THE PRIMARY HOMOGENEOUS THERMAL-DECOMPOSITION CHANNEL [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1980, 102 (17) : 5692 - 5694

[5] KINETICS OF THE DEPOSITION OF SILICON BY SILANE PYROLYSIS AT LOW-TEMPERATURES AND ATMOSPHERIC-PRESSURE [J]. THIN SOLID FILMS, 1979, 60 (01) : 19 - 25

[6] STUDY OF PYROLYSIS OF MONOSILANS BETWEEN 480 AND 580 DEGREES C [J]. JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1974, 71 (10) : 1363 - 1370

[7] A MATHEMATICAL-MODEL OF THE COUPLED FLUID-MECHANICS AND CHEMICAL-KINETICS IN A CHEMICAL VAPOR-DEPOSITION REACTOR [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : 425 - 434

[8] LASER-POWERED HOMOGENEOUS DISSOCIATION OF TETRALIN [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1981, 85 (22) : 3266 - 3276

[9] DETERMINATION OF ARRHENIUS PARAMETERS FOR UNIMOLECULAR REACTIONS OF CHLOROALKANES BY IR LASER PYROLYSIS [J]. JOURNAL OF CHEMICAL PHYSICS, 1982, 77 (09) : 4494 - 4506

[10] OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 51 - 53

[1] KINETICS OF THERMAL UNIMOLECULAR REACTIONS OF CYCLOPROPANE AND CYCLOBUTANE BEHIND REFLECTED SHOCK-WAVES [J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1974, 70 : 1782 - 1792

[2] TEMPERATURE-DEPENDENCE OF THE GROWTH-RATE OF SILICON PREPARED THROUGH CHEMICAL VAPOR-DEPOSITION FROM SILANE [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 153 - 155

[3] BENSON SW, 1970, NSRDS NBS, V21, P223

[4] FLOW PYROLYSIS AND DIRECT AND SIF4-SENSITIZED LASER-INDUCED DECOMPOSITION OF TETRALIN - IDENTIFICATION OF RETRO-[2+4] CLEAVAGE AS THE PRIMARY HOMOGENEOUS THERMAL-DECOMPOSITION CHANNEL [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1980, 102 (17) : 5692 - 5694

[5] KINETICS OF THE DEPOSITION OF SILICON BY SILANE PYROLYSIS AT LOW-TEMPERATURES AND ATMOSPHERIC-PRESSURE [J]. THIN SOLID FILMS, 1979, 60 (01) : 19 - 25

[6] STUDY OF PYROLYSIS OF MONOSILANS BETWEEN 480 AND 580 DEGREES C [J]. JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1974, 71 (10) : 1363 - 1370

[7] A MATHEMATICAL-MODEL OF THE COUPLED FLUID-MECHANICS AND CHEMICAL-KINETICS IN A CHEMICAL VAPOR-DEPOSITION REACTOR [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : 425 - 434

[8] LASER-POWERED HOMOGENEOUS DISSOCIATION OF TETRALIN [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1981, 85 (22) : 3266 - 3276

[9] DETERMINATION OF ARRHENIUS PARAMETERS FOR UNIMOLECULAR REACTIONS OF CHLOROALKANES BY IR LASER PYROLYSIS [J]. JOURNAL OF CHEMICAL PHYSICS, 1982, 77 (09) : 4494 - 4506

[10] OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 51 - 53