OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE

被引：50

作者：

HO, P

BREILAND, WG

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来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 01期

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D O I：

10.1063/1.94548

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：51 / 53

页数：3

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