PULSED UV LASER RAMAN-SPECTROSCOPY OF SILANE IN A LINEAR-FLOW CHEMICAL VAPOR-DEPOSITION REACTOR

被引：24

作者：

BREILAND, WG

KUSHNER, MJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1983年 / 42卷 / 04期

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D O I：

10.1063/1.93919

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：395 / 397

页数：3

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