INSITU FTIR EMISSION-SPECTROSCOPY ON CHEMICAL VAPOR-DEPOSITION PROCESSES

Infrared emission spectroscopy is a suitable method of detecting transient species in the gas phase and on the surface of growing layers inside a chemical vapour deposition process. The required high level of spectroscopic data results in the refinement of IR Fourier spectroscopy, the optimization of measuring conditions and the application of special modulation and spectra processing techniques. Results of the gas boronizing process of steel from BCI3/H2 mixtures and of the deposition of silicon carbide hard coatings from methyltrichlorosilane show the advantages of these techniques. In the gas phase transient species are detectable, e.g. HBCI2, H2BCI, BCI2 in the boron system and SiCI2, SiCI3, CH3, SiH2, Si2H4 in the silicon system, respectively, while on the metalic ironboride layer B-H, B-CI and Fe-CI species are found. © 1990.