DETECTION OF DRY ETCHING PRODUCT SPECIES WITH INSITU FOURIER-TRANSFORM INFRARED-SPECTROSCOPY

被引:26
作者
CLELAND, TA [1 ]
HESS, DW [1 ]
机构
[1] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 01期
关键词
D O I
10.1116/1.584442
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:35 / 40
页数:6
相关论文
共 46 条
[1]   EFFECTS OF DOPING ON POLYSILICON ETCH RATE IN A FLUORINE-CONTAINING PLASMA [J].
BALDI, L ;
BEARDO, D .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) :2221-2225
[2]  
BARROW GM, 1962, INTRO MOL SPECTROSCO
[3]  
CHASE MW, 1971, JANAF THERMOCHEM T S, P78
[4]   INSITU FTIR DIAGNOSTICS OF THE RADIO-FREQUENCY PLASMA DECOMPOSITION OF N2O [J].
CLELAND, TA ;
HESS, DW .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1987, 7 (04) :379-394
[5]  
CLELAND TA, 1988, J APPL PHYS, V64, P1058
[6]  
Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856
[7]   PLASMA-ASSISTED ETCHING IN MICROFABRICATION [J].
COBURN, JW ;
WINTERS, HF .
ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 :91-116
[8]  
CRAWFORD B, 1976, INFRARED RAMAN SPECT, pCH1
[9]  
CURTIS BJ, 1980, SOLID STATE TECHNOL, V23, P129
[10]   REACTION OF ATOMIC AND MOLECULAR CHLORINE WITH ALUMINUM [J].
DANNER, DA ;
HESS, DW .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (03) :940-947