A 3-DIMENSIONAL PHOTORESIST IMAGE SIMULATOR - TRIPS-I

被引:13
作者
MATSUZAWA, T [1 ]
ITO, T [1 ]
TANUMA, M [1 ]
HASEGAWA, N [1 ]
SUNAMI, H [1 ]
机构
[1] HITACHI LTD,HITACHI RES LAB,HITACHI,IBARAKI 31912,JAPAN
关键词
D O I
10.1109/EDL.1985.26175
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:416 / 418
页数:3
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    DILL, FH
    NEUREUTHER, AR
    TUTTLE, JA
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    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 456 - 464
  • [2] CHARACTERIZATION OF POSITIVE PHOTORESIST
    DILL, FH
    HORNBERGER, WP
    HAUGE, PS
    SHAW, JM
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 445 - 452
  • [3] LINE-PROFILE RESIST DEVELOPMENT SIMULATION TECHNIQUES
    JEWETT, RE
    HAGOUEL, PI
    NEUREUTHER, AR
    VANDUZER, T
    [J]. POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) : 381 - 384