SCANNING CATHODOLUMINESCENCE MICROSCOPY - A UNIQUE APPROACH TO ATOMIC-SCALE CHARACTERIZATION OF HETEROINTERFACES AND IMAGING OF SEMICONDUCTOR INHOMOGENEITIES

被引:165
作者
CHRISTEN, J [1 ]
GRUNDMANN, M [1 ]
BIMBERG, D [1 ]
机构
[1] TECH UNIV BERLIN,INST FESTKORPERPHYS 1,W-1000 BERLIN 12,GERMANY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 04期
关键词
D O I
10.1116/1.585704
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Luminescence experiments provide a powerful and nondestructive approach to the ex situ investigation of semiconductor heterointerfaces which might be buried up to several mu-m below the surface in a given complex sample structure. Combined with the ability of taking images simply by scanning the exciting focused electron beam across the area under investigation, lateral fluctuations of electronic properties like the variation of the fundamental band gap E(g) (x,y) can be directly visualized by scanning cathodoluminescence (CL). The novel experimental approach, cathodoluminescence wavelength imaging (CLWI), which involves recording of a complete CL spectrum at every scanning position (x,y), yields direct 3D images of the atomic-scale morphology of quantum wells (QWs) as sensed by the QW exciton: similar to the tip of a scanning tunneling microscope, the exciton samples the local fluctuations of QW thickness L(z) and transforms this structural information L(z) (x,y) into a spectral one, the lateral variation of band gap E(g) (x,y) and thus the CL emission wavelength-lambda-(x,y). Topological maps of QW interfaces can thus be recorded at various positions and at various magnifications. The interface roughness can be investigated statistically at lateral resolution starting with the diameter of the QW exciton up to the mm regime. The same experimental principle for recording lambda-(x,y) and E(g)(x,y) maps is successfully applied for the analysis of patterned structures. In the nonlattice-matched system GaAs on Si, the lateral strain variation causes E(g)(x,y) fluctuations and can thus be directly imaged by CLWI. Metalorganic chemical vapor deposition grown GaAs layers on micropatterned Si(001) substrates show strongly inhomogeneous doping with Si impurities. By means of CLWI the strong increase of this Si incorporation in the vicinity of free {111} surfaces is measured and Si concentration maps are recorded across the complete sample pattern.
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页码:2358 / 2368
页数:11
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