EFFECTS OF TEMPERATURE AND REAGENT CONCENTRATION ON THE MORPHOLOGY OF CHEMICALLY VAPOR-DEPOSITED BETA-TA2O5

被引:13
作者
BAE, YW
LEE, WY
STINTON, DP
机构
[1] Oak Ridge National Laboratory, Oak Ridge, Tennessee
关键词
D O I
10.1111/j.1151-2916.1995.tb08485.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Crystalline beta-Ta2O5 coatings mere deposited on hot-isostatically-pressed Si3N4 by reacting TaCl5 with H-2 and CO2 in the temperature range of 1000 degrees-1300 degrees C and at a pressure of 660 Pa, The Ta2O5 coatings generally consisted of well-coalesced 2-3 mu m grains, resulting in the formation of a nonporous coating morphology. However, the presence of microcracks on the as-deposited surface was consistently observed, The surface morphology, texture, and growth rate of the coatings were examined as a function of deposition parameters.
引用
收藏
页码:1297 / 1300
页数:4
相关论文
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[11]   PREPARATION AND PROPERTIES OF TA2O5 FILMS BY LPCVD FOR ULSI APPLICATION [J].
ZAIMA, S ;
FURUTA, T ;
YASUDA, Y ;
IIDA, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (04) :1297-1300