IN-SITU REDUCTION KINETICS OF NICL2 IN SIO2 GEL MATRIX

被引：11

作者：

BASUMALLICK, A ^{[1
]}

BISWAS, K ^{[1
]}

DAS, GC ^{[1
]}

MUKHERJEE, S ^{[1
]}

机构：

[1] BENGAL ENGN COLL,DEPT MET ENGN,HOWRAH 711103,INDIA

来源：

JOURNAL OF MATERIALS RESEARCH | 1995年 / 10卷 / 11期

关键词：

D O I：

10.1557/JMR.1995.2938

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Silica gels containing NiCl2 and dextrose have been reduced by heat-treating the gels under N-2 atmosphere at 800 degrees C, 850 degrees C, 900 degrees C, and 950 degrees C, respectively, The influence of the volume ratio of ethyl alcohol to tetraethylorthosilicate and the amount of dextrose on the in situ reduction kinetics of NiCl2 in gel matrix have been investigated, The kinetic data on in situ reduction have been analyzed by a reduced time method which indicates that mixed mechanisms are operative, The predominant mechanism of reduction of NiCl2 in SiO2 gel matrix is of nucleation and growth type. The activation energies over different temperatures and fraction converted have been computed by the integration method.

引用

页码：2938 / 2944

页数：7

共 11 条

[1] ELECTRICAL-PROPERTIES OF OXIDE GLASSES CONTAINING BISMUTH AND SELENIUM GRANULES [J].