PHASE MEASUREMENT INTERFEROMETRIC MICROSCOPY OF THIN-FILMS - ANALYSIS OF TOPOGRAPHY, REFRACTIVE-INDEX, AND THICKNESS OF SOLVENT SWOLLEN POLYSTYRENE FILMS

被引：16

作者：

SMITH, CP

FRITZ, DC

TIRRELL, M

WHITE, HS

机构：

[1] Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis

来源：

THIN SOLID FILMS | 1991年 / 198卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(91)90355-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An analysis of phase measurement interferometric microscopy (PMIM) images of optically transparent films is presented. Multiple reflections of light within thin films produce a non-linear relationship between the measured optical thickness h and the true film thickness d, introducing oscillatory surface features in uncorrected PMIM topographical images. A method for simultaneously determining the microtopography, thickness, and refractive index of thin films using optical maxima and minima observed in PMIM images is described. The analysis is used to characterize 100-200 nm thick polystyrene (PS) films deposited on silicon wafers. The refractive index and degree of swelling of a PS film immersed in a mixed solvent, 27% (by volume) toluene in acetonitrile, are reported.

引用

页码：369 / 386

页数：18

共 18 条

[1] DIELECTRIC FUNCTIONS AND OPTICAL-PARAMETERS OF SI, GE, GAP, GAAS, GASB, INP, INAS, AND INSB FROM 1.5 TO 6.0 EV [J].