50-NM RESOLUTION, DEFECT-FREE, ELECTRON-BEAM RESISTS PRODUCED WITH MONOMER POLYMER MULTILAYER FILMS

被引：5

作者：

FARISS, G

LANDO, J

RICKERT, S

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1983年 / 18卷 / 09期

关键词：

D O I：

10.1007/BF00547576

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2603 / 2612

页数：10

共 19 条

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