THICKNESS DEPENDENCE OF INTERNAL VOLTAGE IN METAL-INSULATOR-METAL STRUCTURE WITH DISSIMILAR ELECTRODES

被引：12

作者：

GUPTA, SK ^{[1
]}

SINGAL, CM ^{[1
]}

SRIVASTAVA, VK ^{[1
]}

机构：

[1] UNIV ROORKEE,DEPT PHYS,ROORKEE 247667,UTTAR PRADESH,INDIA

来源：

关键词：

D O I：

10.1063/1.323978

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2583 / 2586

页数：4

共 8 条

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[3]

GUNDLACH KH, 1966, BASIC PROBLEMS THIN, P696

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[5]

SIMMONS JG, 1970, HDB THIN FILM TECHNO, pI14

SRIVASTA.VK ;

VERMA, AR .

SRIVASTAVA, VK ;

VERMA, AR .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1962, 80 (513) :222-&

[8]

SRIVASTAVA VK, 1973, PHYS THIN FILMS, V7, P311