ULTRAHIGH-VACUUM ARC METHOD TO FORM THIN REFRACTORY-METAL FILMS

被引:2
作者
KANAYAMA, M [1 ]
IGARASHI, Y [1 ]
机构
[1] TOHOKU UNIV, DEPT ENGN SCI, SENDAI, MIYAGI 980, JAPAN
关键词
D O I
10.1063/1.1137349
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:220 / 225
页数:6
相关论文
共 25 条
[1]   ARC STABILITY CHARACTERISTICS OF VACUUM SWITCHES [J].
ATTIA, EA .
PROCEEDINGS OF THE IEEE, 1973, 61 (08) :1156-1158
[2]  
Bulyin V. S., 1976, SOV PHYS-TECH PHYS, V20, P561
[3]   FACE-CENTRED CUBIC MODIFICATION IN SPUTTERED FILMS OF TANTALUM MOLYBDENUM TUNGSTEN RHENIUM HAFNIUM AND ZIRCONIUM [J].
CHOPRA, KL ;
RANDLETT, MR ;
DUFF, RH .
PHILOSOPHICAL MAGAZINE, 1967, 16 (140) :261-&
[4]   ANALYSIS OF ELECTRODE PHENOMENA IN THE HIGH-CURRENT ARC [J].
COBINE, JD ;
BURGER, EE .
JOURNAL OF APPLIED PHYSICS, 1955, 26 (07) :895-900
[5]   INITIATION OF ELECTRICAL BREAKDOWN IN VACUUM - REVIEW [J].
DAVIES, DK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :115-121
[6]  
FARRELL JA, 1973, P IEEE, V61, P1156
[7]  
FOWLER P, 1963, J APPL PHYS, V34, P3538
[8]   PULSED METALLIC-PLASMA GENERATORS [J].
GILMOUR, AS ;
LOCKWOOD, DL .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1972, 60 (08) :977-+
[9]   ELECTRICAL BREAKDOWN OF A POINT-PLANE GAP IN HIGH-VACUUM AND WITH VARIATION OF PRESSURE IN RANGE 10-7-10-2 TORR OF AIR, NITROGEN, HELIUM, SULFUR HEXAFLUORIDE, AND ARGON [J].
HACKAM, R ;
RAJU, GRG .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (11) :4784-4794
[10]   EROSION OF METAL CATHODES BY ARCS AND BREAKDOWNS IN VACUUM [J].
HANTZSCHE, E ;
JUTTNER, B ;
PUCHKAROV, VF ;
ROHRBECK, W ;
WOLFF, H .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (12) :1771-1781