LASER-PHOTOLYSIS STUDY OF PRIMARY PHOTOPHYSICAL AND PHOTOCHEMICAL PROCESSES OF BIS(TRIPHENYLSILYL)KETONE

被引：5

作者：

WAKASA, M ^{[1
]}

INOUE, N ^{[1
]}

MOCHIDA, K ^{[1
]}

SAKAGUCHI, Y ^{[1
]}

HAYASHI, H ^{[1
]}

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 35101,JAPAN

来源：

CHEMICAL PHYSICS LETTERS | 1988年 / 143卷 / 03期

关键词：

D O I：

10.1016/0009-2614(88)87372-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：230 / 234

页数：5

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