X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF THE SURFACE OF SPUTTER ION PLATED FILMS

被引:143
作者
ROBINSON, KS
SHERWOOD, PMA
机构
[1] Univ of Newcastle-upon-Tyne, Dep of, Inorganic Chemistry,, Newcastle-upon-Tyne, Engl, Univ of Newcastle-upon-Tyne, Dep of Inorganic Chemistry, Newcastle-upon-Tyne, Engl
关键词
SPECTROSCOPY; X-RAY - Thin Films;
D O I
10.1002/sia.740060603
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
X-ray photoelectron spectroscopic analysis of a reactively sputter ion plated titanium nitride film showed the surface to be oxidized to TiO//2, with a sub-layer of oxynitride. Argon ion etching gave a depth profile of the film, but it preferentially sputtered titanium nitride, and caused mixing of TiO//2 and TiN phases to form titanium oxynitrides. Titanium oxynitride was also produced by nitrogen ion implantation into titanium metal with a surface layer of titanium dioxide.
引用
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页码:261 / 266
页数:6
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