GROWTH OF ZNO BY MOCVD USING ALKYLZINC ALKOXIDES AS SINGLE-SOURCE PRECURSORS

被引：79

作者：

AULD, J

HOULTON, DJ

JONES, AC

RUSHWORTH, SA

MALIK, MA

OBRIEN, P

CRITCHLOW, GW

机构：

[1] UNIV LONDON,QUEEN MARY & WESTFIELD COLL,DEPT CHEM,LONDON E1 4NS,ENGLAND

[2] UNIV LOUGHBOROUGH,INST SURFACE SCI & TECHNOL,LOUGHBOROUGH LE11 3TU,LEICS,ENGLAND

来源：

JOURNAL OF MATERIALS CHEMISTRY | 1994年 / 4卷 / 08期

关键词：

D O I：

10.1039/jm9940401249

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin films of ZnO have been grown by low-pressure MOCVD using methylzinc isopropoxide, MeZn(OPr(i)), and methylzinc tert-butoxide, MeZn(OBu(t)), in the absence of an added oxygen source. The films were grown on to glass substrates in the temperature range 250-400-degrees-C with growth rates of between 0.2 and 4.4 mum h-1.

引用

页码：1249 / 1253

页数：5

共 22 条

[1] INVESTIGATIONS ON COORDINATION CHEMISTRY OF ORGANOZINC COMPOUNDS .12. MASS-SPECTROMETRIC INVESTIGATION OF METHYL ZINC ALCOXIDES
ADLER, B
LACHOWICZ, A
THIELE, KH
[J]. ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1976, 423 (01): : 27 - 34
[2] ARONOVICH J, 1979, J VAC SCI TECHNOL, V16, P994
[3] NEW, CONVENIENT, AND STEREOSPECIFIC METHOD FOR THE DEHYDRATION OF ALCOHOLS - THERMAL-DECOMPOSITION OF MAGNESIUM, ZINC, AND ALUMINUM ALKOXIDES - MECHANISTIC STUDY
ASHBY, EC
WILLARD, GF
GOEL, AB
[J]. JOURNAL OF ORGANIC CHEMISTRY, 1979, 44 (08) : 1221 - 1232
[4] BARNES JO, 1980, J ELECTROCHEM SOC, V7, P1636
[5] ALKOXY- THIO- AND AMINO-DERIVATIVES OF METHYLZINC
COATES, GE
RIDLEY, D
[J]. JOURNAL OF THE CHEMICAL SOCIETY, 1965, (MAR): : 1870 - &
[6] SINGLE-CRYSTAL GROWTH BY MOCVD OF ZINC-BASED CHALCOGENIDES USING NEW GROUP-II ADDUCT SOURCES
COCKAYNE, B
WRIGHT, PJ
ARMSTRONG, AJ
JONES, AC
ORRELL, ED
[J]. JOURNAL OF CRYSTAL GROWTH, 1988, 91 (1-2) : 57 - 62
[7] HIGHLY ORIENTED ZINC-OXIDE FILMS GROWN BY THE OXIDATION OF DIETHYLZINC
GHANDHI, SK
FIELD, RJ
SHEALY, JR
[J]. APPLIED PHYSICS LETTERS, 1980, 37 (05) : 449 - 451
[8] Trimethylamine Complexes of Alane as Precursors for the Low-Pressure Chemical Vapor Deposition of Aluminum
Gladfelter, Wayne L.
Boyd, David C.
Jensen, Klays F.
[J]. CHEMISTRY OF MATERIALS, 1989, 1 (03) : 339 - 343
[9] ON THE USE OF BASIC ZINC ACETATE ZN4O(CH3CO2)6 AS A NOVEL PRECURSOR FOR THE DEPOSITION OF ZNO BY LOW-PRESSURE METALLO ORGANIC-CHEMICAL VAPOR-DEPOSITION - THEIR CHARACTERIZATION BY LOW-ENERGY ELECTRON INDUCED X-RAY-EMISSION SPECTROSCOPY
GYANI, AK
KHAN, OFZ
OBRIEN, P
URCH, DS
[J]. THIN SOLID FILMS, 1989, 182 : L1 - L3
[10] DC REACTIVE MAGNETRON SPUTTERED ZNO FILMS
HATA, T
MINAMIKAWA, T
MORIMOTO, O
HADA, T
[J]. JOURNAL OF CRYSTAL GROWTH, 1979, 47 (02) : 171 - 176

← 1 2 3 →