PILOT PRODUCTION OF HALF-MICRON X-RAY MASKS

[1] COTE DA, 1987, SPIE, V772

[2] FENCIL CR, 1986, MICROCIRCUIT ENG, V5

[3] MEASUREMENT AND CONTROL OF ABSORBER STRESS IN THE FABRICATION OF X-RAY MASKS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1924 - 1926

[4] MCINTOSH RB, 1986, SPIE, V632, P18

[5] HIGH-RESOLUTION PATTERN REPLICATION USING SOFT X-RAYS [J]. ELECTRONICS LETTERS, 1972, 8 (04) : 102 - &

[6] Yanof A. W., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V632, P118, DOI 10.1117/12.963676

[1] COTE DA, 1987, SPIE, V772

[2] FENCIL CR, 1986, MICROCIRCUIT ENG, V5

[3] MEASUREMENT AND CONTROL OF ABSORBER STRESS IN THE FABRICATION OF X-RAY MASKS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1924 - 1926

[4] MCINTOSH RB, 1986, SPIE, V632, P18

[5] HIGH-RESOLUTION PATTERN REPLICATION USING SOFT X-RAYS [J]. ELECTRONICS LETTERS, 1972, 8 (04) : 102 - &

[6] Yanof A. W., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V632, P118, DOI 10.1117/12.963676