CORRELATION BETWEEN COHESIVE ENERGY AND MIXING RATE IN ION MIXING OF METALLIC BILAYERS

被引：50

作者：

VANROSSUM, M ^{[1
]}

CHENG, YT ^{[1
]}

NICOLET, MA ^{[1
]}

JOHNSON, WL ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 06期

关键词：

D O I：

10.1063/1.95557

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：610 / 612

页数：3

共 15 条

[1] DEPTH RESOLUTION OF SPUTTER PROFILING [J].

ANDERSEN, HH .

APPLIED PHYSICS, 1979, 18 (02) :131-140

[2]

AVERBACK RS, COMMUNICATION

[3] SHORT-RANGE AND LONG-RANGE ION-BEAM MIXING IN CU-AL - INFLUENCE OF INTERFACIAL OXIDE [J].

BESENBACHER, F ;

BOTTIGER, J ;

NIELSEN, SK ;

WHITLOW, HJ .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 29 (03) :141-145

[4]

Cheng Y., UNPUB

[5] INFLUENCE OF CHEMICAL DRIVING FORCES IN ION MIXING OF METALLIC BILAYERS [J].

CHENG, YT ;

VANROSSUM, M ;

NICOLET, MA ;

JOHNSON, WL .

APPLIED PHYSICS LETTERS, 1984, 45 (02) :185-187

[6]

GUINAN MW, 1981, J NUCL MATER, V103, P1319

[7]

Hultgren RR, 1973, SELECTED VALUES THER

[8]

JOHNSON WL, 1984, UNPUB JUL INT C ION

[9] THE DISPLACEMENT OF ATOMS IN SOLIDS BY RADIATION [J].

KINCHIN, GH ;

PEASE, RS .

REPORTS ON PROGRESS IN PHYSICS, 1955, 18 :1-51

[10]

MIEDEMA AR, 1976, PHILIPS TECH REV, V8, P36

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