REACTION OF NH3 WITH TRICHLOROSILYLATED SILICA-GEL - A STUDY OF THE REACTION-MECHANISM AS A FUNCTION OF TEMPERATURE

被引:17
作者
VANDERVOORT, P [1 ]
VRANCKEN, KC [1 ]
VANSANT, EF [1 ]
RIGA, J [1 ]
机构
[1] INST STUDIES INTERFACE SCI,INTERDISCIPLINAIRE SPECTR ELECTR,B-5000 NAMUR,BELGIUM
来源
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS | 1993年 / 89卷 / 14期
关键词
D O I
10.1039/ft9938902509
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Activation of the silica substrate with chlorosilanes increases the ammonia uptake by a factor of 5-10, compared with untreated silica. The reaction mechanism of ammonia with trichlorosilylated silica gel is examined in detail. Physisorbed NH4Cl causes a shift in the Si-NH2 stretching vibrations. Several side reactions occur during the chlorosilylation step, the ammoniation step and the thermal treatment of the reacted sample. Amine functions subsequently convert to silazanes and eventually nitrides. A novel mechanism for silazane formation is proposed. The different species on the silica surface are quantified as a function of the reaction temperature.
引用
收藏
页码:2509 / 2513
页数:5
相关论文
共 28 条
[1]   CHEMISORPTION OF AMMONIA ON SILICA [J].
BLOMFIELD, GA ;
LITTLE, LH .
CANADIAN JOURNAL OF CHEMISTRY, 1973, 51 (11) :1771-1781
[2]   THERMOCHEMICAL NITRIDATION OF MICROPOROUS SILICA FILMS IN AMMONIA [J].
BROW, RK ;
PANTANO, CG .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1987, 70 (01) :9-14
[3]   THE EFFECT OF THE SILANE DEPOSITION CONDITIONS ON THE DURABILITY OF ALUMINUM JOINTS PRETREATED USING 3-AMINOPROPYLTRIMETHOXYSILANE [J].
CAVE, NG ;
KINLOCH, AJ .
JOURNAL OF ADHESION, 1991, 34 (1-4) :175-187
[4]  
FINK P, 1988, WISS ZTSCH FSU, P919
[5]  
FOWLES GWA, 1964, PROGR INORGANIC CHEM, V6
[6]  
GARDELLA DA, 1983, APPL SPECTROSC, V37, P1311
[7]  
GILLISDHAMERS I, 1990, P INT WORKSHOP FTIR, P227
[8]   INVESTIGATION OF QUANTITATIVE SIOH DETERMINATION BY THE SILANE TREATMENT OF DISPERSE SILICA [J].
GORSKI, D ;
KLEMM, E ;
FINK, P ;
HORHOLD, HH .
JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1988, 126 (02) :445-449
[9]  
HABRAKEN F, 1992, APPL SPECTROSC, V53, P1982
[10]  
LEDNOR PW, 1989, J CHEM SOC CHEM COMM, V320, P2647